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51INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION

INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION

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Source URL: public.itrs.net

Language: English - Date: 2014-03-27 11:40:57
521  Table ORTC1 Summary 2013 ORTC Technology Trend Targets (click this link for the detailed table)

1 Table ORTC1 Summary 2013 ORTC Technology Trend Targets (click this link for the detailed table)

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Source URL: public.itrs.net

Language: English - Date: 2014-03-31 10:00:35
531  Table FEP1 Front End Processes Difficult Challenges

1 Table FEP1 Front End Processes Difficult Challenges

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Source URL: www.itrs.net

Language: English - Date: 2014-03-27 11:42:22
541  Table ORTC1 Summary 2013 ORTC Technology Trend Targets (click this link for the detailed table)

1 Table ORTC1 Summary 2013 ORTC Technology Trend Targets (click this link for the detailed table)

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Source URL: www.itrs.net

Language: English - Date: 2014-03-31 10:00:35
551  Table MET1 Difficult Challenges ≥ 12 nm Factory level and company wide metrology integration for real-time in situ, integrated, and inline metrology

1 Table MET1 Difficult Challenges ≥ 12 nm Factory level and company wide metrology integration for real-time in situ, integrated, and inline metrology

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Source URL: www.itrs.net

Language: English - Date: 2014-03-21 15:43:04
56INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION

INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION

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Source URL: www.itrs.net

Language: English - Date: 2014-03-27 11:40:57
57Microsoft PowerPoint - AZnano08.ppt

Microsoft PowerPoint - AZnano08.ppt

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Source URL: aznano.org

Language: English - Date: 2014-01-08 05:03:35
58Microsoft Word - Bio - Reza Arghavani LRCX

Microsoft Word - Bio - Reza Arghavani LRCX

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Source URL: microlab.berkeley.edu

Language: English - Date: 2014-01-13 18:23:07
59Datasheet  QuickCap NX 3D Field Solver  Overview

Datasheet QuickCap NX 3D Field Solver Overview

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Source URL: www.synopsys.com

Language: English - Date: 2014-11-07 14:32:38
60Abstract For the past 40 years, relentless focus on Moore’s Law transistor scaling has provided ever-increasing transistor performance and density. In order to continue the technology scaling beyond 22nm node, it is cl

Abstract For the past 40 years, relentless focus on Moore’s Law transistor scaling has provided ever-increasing transistor performance and density. In order to continue the technology scaling beyond 22nm node, it is cl

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Source URL: etd.ncsi.iisc.ernet.in

Language: English - Date: 2014-07-18 03:11:59